Plasma processing
From Wikipedia, the free encyclopedia
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]
Plasma processing techniques include:
- Plasma activation
- Plasma ashing
- Plasma cleaning
- Plasma electrolytic oxidation
- Plasma etching
- Plasma functionalization
- Plasma polymerization
- Corona treatment
- Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
References
Page Template:Reflist/styles.css has no content.
- ^ Page Module:Citation/CS1/styles.css has no content.National Research Council (1991). Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: National Academies Press. doi:10.17226/1875. ISBN 978-0-309-04597-1.
