Triethylgallium

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Triethylgallium
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Names
IUPAC name
triethylgallane
Systematic IUPAC name
triethylgallium
Identifiers
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3D model (JSmol)
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  • InChI=1S/3C2H5.Ga/c3*1-2;/h3*1H2,2H3;
    Key: RGGPNXQUMRMPRA-UHFFFAOYSA-N
  • CC[Ga](CC)CC
Properties
C6H15Ga
Molar mass 156.9 g/mol
Appearance colourless liquid
Melting point −82.3 °C (−116.1 °F; 190.8 K)
Boiling point 143 °C (289 °F; 416 K)
Reacts[1]
Hazards
Related compounds
Related compounds
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Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

Template:Chembox Footer/trackingTemplate:Short description

Triethylgallium is the organogallium compound with the formul Ga(C2H5)3. Also called TEGa, it is a metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) of compound semiconductors. It is a colorless pyrophoric liquid,[2] typically handled with air-free techniques. It was discovered by Cornell University chemists L. M. Dennis and Winton Patnode in 1931.[3]

Preparation and reactions

The main routes involve alkylation of gallium trichloride. When this alkylation is effected with ethyl Grignard reagent in ether, the product is the diethyl ether adduct of triethylgallium. The ether is not easily removed. Thus an alternative route involves transmetalation with triethylaluminium according to this simplified equation:[4]

Page Module:Chem2/styles.css has no content.GaCl3 + 3 AlEt3 → GaEt3 + 3 AlClEt2

Triethylgallium readily converts to the air-stable, colorless alkoxide by two routes, oxidation and alcoholysis:[4]

Page Module:Chem2/styles.css has no content.GaEt3 + 0.5 O2 → GaEt2(OEt)
Page Module:Chem2/styles.css has no content.GaEt3 + EtOH → GaEt2(OEt) + EtH

The sweet odor associated with triethylgallium is due to the alkoxide.

Redistribution reactions occur with gallium trichloride:[4]

Page Module:Chem2/styles.css has no content.2GaEt3 + GaCl3 → 3 GaEt2Cl

Applications

TEGa can be a useful alternative to trimethylgallium in the metalorganic vapour phase epitaxy of compound semiconductors because films grown using TEGa have been shown to have a lower carbon impurity concentration.[5]

References

  1. ^ amdg.ece.gatech.edu/msds/mo/teg_epichem.pdf
  2. ^ Page Module:Citation/CS1/styles.css has no content.Shenaikhatkhate, D; Goyette, R; Dicarlojr, R; Dripps, G (2004). "Environment, health and safety issues for sources used in MOVPE growth of compound semiconductors". Journal of Crystal Growth. 272 (1–4): 816–821. Bibcode:2004JCrGr.272..816S. doi:10.1016/j.jcrysgro.2004.09.007.
  3. ^ Page Module:Citation/CS1/styles.css has no content.Dennis, L. M.; Patnode, Winton (January 1932). "GALLIUM TRIETHYL MONOETHERATE, GALLIUM TRIETHYL, GALLIUM TRIETHYL AMMINE1". Journal of the American Chemical Society. 54 (1): 182–188. doi:10.1021/ja01340a024. ISSN 0002-7863.
  4. ^ a b c Page Module:Citation/CS1/styles.css has no content.J.J.Eisch, R. B. King, ed. (1981). Organometallic Syntheses Volume 2. Nontransition Metal Compounds. NY, NY: Academic Press.
  5. ^ Page Module:Citation/CS1/styles.css has no content.Saxler, A; Walker, D; Kung, P; Zhang, X; Razeghi, M; Solomon, J; Mitchel, W; Vydyanath, H (1997). "Comparison of trimethylgallium and triethylgallium for the growth of GaN". Applied Physics Letters. 71 (22): 3272–3274. Bibcode:1997ApPhL..71.3272S. doi:10.1063/1.120310.

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